CeilClean IPS Ionizing Particulate Scrubber

CeilCleanIPS CeilClean IPS Ionizing Particulate Scrubber...
For Changing Emissions Standards


The CeilClean IPS features Verantis' proven ionizing technology in a
compact package configured to meet stringent particulate requirements such as EPA-MACT PM2.5 regulations. This innovative product scrubs fumes & particulate in ONE unit.

Verantis Scrubber Technology :

Both the IWS and CeilClean IPS are based on a proven means for the removal of pollutants from industrial process gas streams. The IWS and IPS combine the established principles of electrostatic particle charging, image force attraction, inertial impaction, and gas absorption to collect submicron solid particles, liquid particles and noxious and malodorous gases simultaneously. These systems require minimal energy, and collection efficiency is high for both submicron and micron size particles.

Features & Benefits:




 Product Literature

CeilCean IPS

 

 

 

How IPS Scrubbers Work


Verantis' IWS® and IPS™ scrubbers use high voltage ionization to electrostatically charge particulate in the gas stream before the particles enter a Tellerette® packed scrubber section where they are removed by attraction of the charged particles to neutral surfaces.

Patented Technology with Tellerettes®


Tellerette® Packing has a unique patented toroidal helix design that makes them dramatically more efficient than conventional packing for mass transfer, heat transfer and particulate collection.


Benefits include:

Greater gas flow capacity permits use of smaller diameter,
lower cost columns. Existing towers can be retrofitted for higher capacity
and improved efficiency.
  • Lower pressure drop for reduced operating costs.
  • Minimal fouling because of high open area.
  • Effective impingement of both liquid droplets
    and solid particulate.
  • Available in a wide range of materials including
    polypropylene, polyethylene, PVC, PVDF, and Tefzel.

 

Visit Our Tellerette® Page.




Induced Surface Charge


The predominant influence acting within the CeilClean IPS and IWS to collect submicron size particulate is the mechanism of impingement of electrons on particulate "Image Force Attraction."

Image force attraction occurs whenever an electrostatically charged particle comes within the boundary layer (usually within one millimeter) of a neutral surface. As the charged particle comes close to the neutral surface, an electrostatic charge of opposite polarity is induced at the neutral surface.

The force of attraction is similar to that which would exist between a charged particle and an imaginary particle of equal but opposite polarity located at an equal distance behind the surface. It is as though the charged particle was seeing its "mirror image."

Typical Markets & Applications: IWS System and CeilClean IPS



Metal Refining and Recovery - Metal oxides, metal salts and acid gases

Incineration - Hazardous waste, chemical or pathological heavy metals, HCl, HF

Boiler Exhaust - Ash, metals, HCl, SO2

Semiconductor - NH4Cl fume from cross-ventilation

Diesel Engine Exhaust - Ash, SO2

Fiber-Optic and Specialty Glass Production - HCl, Cl2, SiO2, GeO2

Pulp, Paper, Wood Processing - Ammonium bisulfite fumes, dust, condensable organics

Other processes requiring removal of submicron particulate

Visit Our Markets Page.


 

 

 

Tellerettes Special Offer!
5% discount on all orders and FREE upgraded palletized shipping for large orders!
Click below for details.

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